Direct-write lithography system SP2026

Summary

Hahn-Schickard gGmbH is procuring the design, supply, installation, commissioning, acceptance and documentation of a new maskless lithography system for high-precision, submicrometre exposure of photoresists. The system is intended to support the production of temporary and permanent masks, selective etching or deposition of metal layers, and the creation of microfluidic channels, for research and development as well as small- and medium-sized production runs. The procurement is not divided into lots, and performance is to be completed by 30 June 2027.