Wet process bench for mask and wafer processing

Summary

The tender covers the supply of one wet process bench for cleaning and etching metal shadow masks and wafers in a cleanroom. The equipment must meet detailed technical requirements concerning ISO 5 cleanroom use, explosion protection, ultrasonic and QDR baths, chemical resistance, extraction, leak protection and waste handling. The bidder must provide a company profile, turnover data for 2022–2024, comparable references dating from 2023 or later, a bank guarantee confirmation, signed declarations and a complete technical tender. The award criteria are price at 50%, technical design at 20% and binding delivery time at 30%. The tender submission deadline is 15 October 2026.