Delivery of a ready-to-operate magnetron sputtering system for thin-film materials development

Summary

The University of Kassel is procuring a ready-to-operate automated multi-target magnetron sputtering system for thin-film materials development, particularly for coating wafers up to 150 mm in diameter in the university’s cleanroom. The system is to include three 2-inch magnetron sputtering sources, a 500 W DC power supply and a 1 kW bipolar pulsed-DC power supply, three independently controlled process-gas lines, a rotating substrate table heatable to at least 600°C, a bias upgrade, motorised shutters and computer-based control with programmable processes. The supply also includes computer equipment and software, installation, commissioning, operator training, documentation and warranty. Delivery is due by 15 March 2027 and the complete system must be commissioned by 15 April 2027; the procurement is not divided into lots.