Supply of an Atomic Layer Deposition System (ALD)

Summary

Heidelberg University is procuring one new system for thermal and plasma-enhanced atomic layer deposition (ALD), for producing high-precision nanometre-scale thin films on planar and three-dimensionally structured substrates. The system is intended for depositing superconducting films, including niobium nitride, dielectric and magnetic materials, and high-k dielectrics, with precise in-situ layer-thickness monitoring. The supply includes delivery, installation and commissioning, functional testing, acceptance, user instruction and three days of on-site training for two university employees; the procurement is not divided into lots.