Tender detail
Delivery and installation of an ICP reactive ion etcher for silicon dielectrics
Summary
The Technical University of Denmark’s DTU Nanolab is procuring delivery and installation of a high-ion-density reactive ion etcher for processing silicon oxides and nitrides. The instrument is to process 150 mm wafers; an upgrade kit for 200 mm wafers must be offered as an option, and DTU may also purchase one additional identical instrument. Delivery is expected no later than the third quarter of 2027.
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