Electron beam lithography system tender

Summary

The tender concerns the purchase of an electron beam lithography system for the MESA+ Institute of the University of Twente. The system must be suitable for patterning electron-sensitive resists, offer high resolution and high speed, and be compatible with a wide range of applications and substrate types up to 200 mm in diameter. This is an open procedure, and bids must be submitted by 14 August 2026 at 10:00. The machine-readable notice did not include precise exclusion grounds or qualification requirements; these must be checked in the official tender documents.